Frequency-informed deep-learning denoising method supporting sub-nm metrology for high NA EUV lithography
| Autor: | Kim, Ryoung-Han, Lafferty, Neal V., Kim, Minjung, Cerbu, Dorin, Dogru, Selim, Sastry, Kumara, Lorusso, Gian, Zidan, Mohamed, Saib, Mohamed, Severi, Joren, De Simone, Danilo, Singh, Vivek |
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| Zdroj: | Proceedings of SPIE; April 2023, Vol. 12495 Issue: 1 p124951D-124951D-7, 1124567p |
| Databáze: | Supplemental Index |
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