A holistic approach to model-based stochastic-aware computational lithography

Autor: Lio, Anna, Burkhardt, Martin, Wang, ChangAn, Fan, Yongfa, Feng, Mu, Xie, Qian, Wang, Jazer, Kaplan, Chris, Crouse, Michael, Li, Xiaoyang, Hsu, Stephen, Cao, Peigen, Peng, Yi-Hsing, Chang, Stephen, Ye, Jun, Zhang, Youping, Cheng, Bin, Yang, Ken, Zheng, Leiwu, Wang, Jen-Shiang, Peng, Austin, Yeh, Li-Hao, Zhang, Cuiping, Howell, Rafael, Tan, Alexander, Zhao, Yiqiong, Lang, Jun, Zhang, Xiaolong
Zdroj: Proceedings of SPIE; April 2023, Vol. 12494 Issue: 1 p124940B-124940B-8, 1124469p
Databáze: Supplemental Index