Aerial image metrology (AIMS) based mask-model accuracy improvement for computational lithography
| Autor: | Kasprowicz, Bryan S., Liang, Ted, Pandey, N., Hunsche, S., Lyons, A., Chen, J., la Greca, R., Capelli, R., Kersteen, G. |
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| Zdroj: | Proceedings of SPIE; December 2022, Vol. 12293 Issue: 1 p122930R-122930R-15, 12170086p |
| Databáze: | Supplemental Index |
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