Continuous improvement of defectivity rate and CD uniformity in immersion lithography via track co-optimization method

Autor: Sanders, Daniel P., Guerrero, Douglas, Nacenta Mendivil, Jorge P., Frolet, Nathalie, Jullian, Karine, May, Michael, Tanaka, Yuji, Royer, Alexis, Harumoto, Masahiko, Tiron, Raluca
Zdroj: Proceedings of SPIE; July 2022, Vol. 12055 Issue: 1 p120550U-120550U-8, 1084959p
Databáze: Supplemental Index