| Autor: |
Otsuka, Rikuro, Ueno, Yukihiro |
| Zdroj: |
Japanese Journal of Applied Physics; January 1985, Vol. 24 Issue: 4 p131-131, 1p |
| Abstrakt: |
Thermally stimulated exo-emission from an oxidized nickel surface was investigated in comparison with that from the cleavage plane of a single crystal and a pressed-powder disk of nickel oxide. These specimens produced similar glow curves with emission peaks at 400 and 520 K. The 520 K peak was nearly constant and independent of the atmospheric pressure at which the specimens were oxidized. However, the intensity of the 400 K peak was proportional to the 6th root of the pressure. This fact implies that the intensity is directly proportional to the concentration of the nickel ion-vacancy in nickel oxide. It was revealed that the exo-electron source producing the 400 K peak is closely correlated to the vacancy. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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