| Autor: |
Jimenez, C., Guillon, H., Pierret, B., Stadel, O., Schmidt, J., Krause, U., Wahl, G., Jimenez, C., Guillon, H., Pierret, B., Stadel, O., Schmidt, J., Krause, U., Wahl, G. |
| Zdroj: |
Journal de Physique IV - Proceedings; September 2001, Vol. 11 Issue: 1 pPr3-669-Pr3-674, 6693672p |
| Abstrakt: |
A vapour source for MOCVD applications has been developed. This source presents a clear advantage when using solid precursors dissolved in an organic solvent. Vapour sources of solid precursors by direct heating are not reproducible; the use of a solution of one or more components is the best way to control the mass sent to the reactor accurately. Several solutions have been proposed to introduce the solution into the evaporation zone. In this work, we present the characterization of a vapour source that allows to separate the solvent from the precursors before introducing the precursors vapours into the deposition chamber. In this way, vapours from the precursors are only sent to the deposition chamber. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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