Contact hole shrink of 193nm NTD immersion resist
| Autor: | Gronheid, Roel, Sanders, Daniel P., Kaitz, Joshua, Wu, Janet, Jain, Vipul, Ke, Iou-Sheng, Li, Mingqi, Kwok, Amy, Park, James, Park, Jong, Sung, Jin Wuk, Liu, Cong |
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| Zdroj: | Proceedings of SPIE; March 2019, Vol. 10960 Issue: 1 p1096022-1096022-9 |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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