EUV resists comprised of main group organometallic oligomeric materials
| Autor: | Wallow, Thomas I., Hohle, Christoph K., Passarelli, James, Cardineau, Brian, Del Re, Ryan, Sortland, Miriam, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Neisser, Mark, Freedman, Daniel A., Brainard, Robert L. |
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| Zdroj: | Proceedings of SPIE; March 2014, Vol. 9051 Issue: 1 p90512A-90512A-9, 814618p |
| Databáze: | Supplemental Index |
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