Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Autor: Cain, Jason P., Sanchez, Martha I., Chen, Kai-Hsiung, Huang, GT, Chen, KS, Hsieh, C. W., Chen, YC, Ke, CM, Gau, TS, Ku, YC, Bhattacharyya, Kaustuve, Huang, Jacky, den Boef, Arie, v. d. Schaar, Maurits, Maassen, Martijn, Plug, Reinder, Zhang, Youping, Meyer, Steffen, van Veen, Martijn, de Ruiter, Chris, Wu, Jon, Xu, Hua, Chow, Tatung, Chen, Charlie, Verhoeven, Eric, Li, Pu, Hinnen, Paul, Storms, Greet, Pao, Kelvin, Zhang, Gary, Fouquet, Christophe, Mori, Takuya
Zdroj: Proceedings of SPIE; April 2014, Vol. 9050 Issue: 1 p90500S-90500S-10, 8959511p
Databáze: Supplemental Index