Analysis and optimization of process-induced electromigration on signal interconnects in 16nm FinFET SoC (system-on-chip)

Autor: Sturtevant, John L., Capodieci, Luigi, Ban, Yongchan, Choi, Changseok, Shin, Hosoon, Kang, Yongseok, Paik, Woo Hyun
Zdroj: Proceedings of SPIE; March 2014, Vol. 9053 Issue: 1 p90530P-90530P-11, 8962482p
Databáze: Supplemental Index