Aluminum dual damascene metallization for 0.175 @mm DRAM generations and beyond (invited)
| Autor: | Schnabel, R.F., Clevenger, L.A., Costrini, G., Dobuzinsky, D.M., Filippi, R., Gambino, J., Lee, G.Y., Iggulden, R.C., Lin, C., Lu, Z.G. |
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| Zdroj: | Microelectronic Engineering; 2000, Vol. 50 Issue: 1 p265-270, 6p |
| Databáze: | Supplemental Index |
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