Implant dopant activation comparison between silicon and germanium.
| Autor: | Borland, John O., Konkola, Paul T. |
|---|---|
| Zdroj: | 2014 20th International Conference on Ion Implantation Technology (IIT); 2014, p1-4, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Borland, John O., Konkola, Paul T. |
|---|---|
| Zdroj: | 2014 20th International Conference on Ion Implantation Technology (IIT); 2014, p1-4, 4p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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