Atmospheric pressure chemical vapor deposition of silicon thin films using cyclohexasilane.
Autor: | Guruvenket, Srinivasan, Hoey, Justin, Anderson, Kenneth, Frohlich, Matt, Strommen, Gregory, Sailer, Robert, Boudjouk, Philip |
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Zdroj: | 2014 IEEE 40th Photovoltaic Specialist Conference (PVSC); 2014, p3068-3070, 3p |
Databáze: | Complementary Index |
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