Wafer level warpage characterization for backside manufacturing processes of TSV interposers.

Autor: Jiang, Feng, Wang, Qibin, Xue, Kai, Jing, Xiangmeng, Yu, Daquan, Shangguan, Dongkai
Zdroj: 2014 IEEE 64th Electronic Components & Technology Conference (ECTC); 2014, p1740-1744, 5p
Databáze: Complementary Index