Autor: |
Rej, D. J., Bartsch, R. R., Davis, H. A., Faehl, R. J., Greenly, J. B., Waganaar, W. J. |
Předmět: |
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Zdroj: |
Review of Scientific Instruments; Oct93, Vol. 64 Issue 10, p2753, 8p |
Abstrakt: |
A relatively long-pulse width (0.1-1 µs) intense ion beam accelerator has been built for materials processing applications. An applied B[sub r], magnetically insulated extraction ion diode with dielectric flashover ion source is installed directly onto the output of a 1.2 MV, 300-kJ Marx generator. The diode is designed with the aid of multidimensional particle-in-cell simulations. Initial operation of the accelerator at 0.4 MV indicates satisfactory performance without the need for additional pulse shaping. The effect of a plasma opening switch on diode behavior is considered. [ABSTRACT FROM AUTHOR] |
Databáze: |
Complementary Index |
Externí odkaz: |
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