| Autor: |
Jacq, S, Cardinaud, C, Brizoual, L Le, Granier, A |
| Předmět: |
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| Zdroj: |
Plasma Sources Science & Technology; Oct2013, Vol. 22 Issue 5, p055004-055012, 9p |
| Abstrakt: |
Pulsed plasmas are very powerful tools to investigate mechanisms. This paper is focused on H atom kinetics in low-pressure high-density inductively coupled pulsed plasmas. We explore pure H2, H2/N2, CH4/H2 and CH4/N2 mixtures. These gas mixtures offer two very different kinds of wall conditions, which are stainless-steel and hydrocarbon-coated walls. It shows that H loss probability (β) is sensitive to wall conditions. Efforts are made to understand β evolutions with the different parameters. The effect of pressure in non-depositing plasmas is also investigated. Evolution of H atom surface loss probability is linked to ion flux measurements. Ion bombardment promotes H surface loss. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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