A Statistical Model for Electromigration Induced Failure in Thin Film Conductors.
| Autor: | Venables, John D., Lye, Robert G. |
|---|---|
| Zdroj: | 10th Reliability Physics Symposium; 1972, p159-164, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
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| Autor: | Venables, John D., Lye, Robert G. |
|---|---|
| Zdroj: | 10th Reliability Physics Symposium; 1972, p159-164, 6p |
| Databáze: | Complementary Index |
| Externí odkaz: |
|