Advanced dielectrics for gate oxide, DRAM and RF capacitors.
| Autor: | van Dover, R.B., Fleming, R.M., Schneemeyer, L.F., Alers, G.B., Werder, D.J. |
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| Zdroj: | International Electron Devices Meeting 1998 Technical Digest (Cat No98CH36217); 1998, p823-826, 4p |
| Databáze: | Complementary Index |
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