| Autor: |
Ma, Zhengxiang, Becker, Andrew J., Polakos, P., Huggins, Harold, Pastalan, John, Hui Wu, Watts, K., Wong, Y. H., Mankiewich, P. |
| Předmět: |
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| Zdroj: |
IEEE Transactions on Electron Devices; Aug98, Vol. 45 Issue 8, p1811, 6p, 4 Diagrams, 3 Graphs |
| Abstrakt: |
Presents a study which examined the developed novel technique for measuring the dielectric constant and loss tangent of a thin film dielectric material. Experimental technique; Experimental results; Conclusions. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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