The effects of minute impurities (H, OH, F) on the SiO/sub 2//Si interface investigated by nuclear resonant reaction and electron spin resonance.

Autor: Ohji, Y., Nishioka, Y., Yokogawa, K., Mukai, K., Qiu, Q., Arai, E., Sugano, T.
Zdroj: 27th Annual Proceedings, International Reliability Physics Symposium; 1989, p82-87, 6p
Databáze: Complementary Index