Excimer laser-based lithography for 0.5 µm device technology.
| Autor: | Bennewitz, J.H., Escher, G.C., Feldman, M., Firtion, V.A., Jewell, T.E., Pol, V., Wilcomb, B.E., Clemens, J.T. |
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| Zdroj: | 1986 International Electron Devices Meeting; 1986, p312-315, 4p |
| Databáze: | Complementary Index |
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