| Autor: |
Rout, Bibhudutta, Dhoubhadel, Mangal S., Poudel, Prakash R., Kummari, Venkata C., Pandey, Bimal, Deoli, Naresh T., Lakshantha, Wickramaarachchige J., Mulware, Stephen J., Baxley, Jacob, Manuel, Jack E., Pacheco, Jose L., Szilasi, Szabolcs, Weathers, Duncan L., Reinert, Tilo, Glass, Gary A., Duggan, Jerry L., McDaniel, Floyd D. |
| Předmět: |
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| Zdroj: |
AIP Conference Proceedings; Jul2013, Vol. 1544 Issue 1, p11-18, 8p, 3 Black and White Photographs, 3 Diagrams, 2 Graphs |
| Abstrakt: |
The Ion Beam Modification and Analysis Laboratory (IBMAL) at the University of North Texas includes several accelerator facilities with capabilities of producing a variety of ion beams from tens of keV to several MeV in energy. The four accelerators are used for research, graduate and undergraduate education, and industrial applications. The NEC 3MV Pelletron tandem accelerator has three ion sources for negative ions: He Alphatross and two different SNICS-type sputter ion sources. Presently, the tandem accelerator has four high-energy beam transport lines and one low-energy beam transport line directly taken from the negative ion sources for different research experiments. For the low-energy beam line, the ion energy can be varied from ∼20 to 80 keV for ion implantation/modification of materials. The four post-acceleration beam lines include a heavy-ion nuclear microprobe; multi-purpose PIXE, RBS, ERD, NRA, and broad-beam single-event upset; high-energy ion implantation line; and trace-element accelerator mass spectrometry. The NEC 3MV single-ended Pelletron accelerator has an RF ion source mainly for hydrogen, helium and heavier inert gases. We recently installed a capacitive liner to the terminal potential stabilization system for high terminal voltage stability and high-resolution microprobe analysis. The accelerator serves a beam line for standard RBS and RBS/C. Another beamline for high energy focused ion beam application using a magnetic quadrupole lens system is currently under construction. This beam line will also serve for developmental work on an electrostatic lens system. The third accelerator is a 200 kV Cockcroft-Walton accelerator with an RF ion source. The fourth accelerator is a 2.5 MV Van de Graaff accelerator, which was in operation for last several decades is currently planned to be used mainly for educational purpose. Research projects that will be briefly discussed include materials synthesis/modification for photonic, electronic, and magnetic applications, surface sputtering and micro-fabrication of materials, development of high-energy ion microprobe systems, and educational and outreach activities. [ABSTRACT FROM AUTHOR] |
| Databáze: |
Complementary Index |
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