Trap levels in the atomic layer deposition-ZnO/GaN heterojunction-Thermal admittance spectroscopy studies.

Autor: Krajewski, Tomasz A., Stallinga, Peter, Zielony, Eunika, Goscinski, Krzysztof, Kruszewski, Piotr, Wachnicki, Lukasz, Aschenbrenner, Timo, Hommel, Detlef, Guziewicz, Elzbieta, Godlewski, Marek
Předmět:
Zdroj: Journal of Applied Physics; May2013, Vol. 113 Issue 19, p194504, 6p, 2 Charts, 7 Graphs
Abstrakt: In this work, a n-ZnO/p-GaN heterojunction is analyzed using admittance spectroscopy techniques. Capacitance transient measurements performed at 10 kHz reveal four majority-carrier deep levels, the most important one located at approximately 0.57 eV below the ZnO conduction band (CB) edge with a density about two orders of magnitude below the doping level (NT = 4 × 1015 cm-3). The others, located at 0.20 eV, 0.65 eV, and 0.73 eV, are about three orders of magnitude below the doping level (NT = 4-9 × 1014 cm-3). [ABSTRACT FROM AUTHOR]
Databáze: Complementary Index