Improved LOCOS isolation for thin-film SOI MOSFETs.

Autor: Colinge, J.P., Crahay, A., De Ceuster, D., Dessard, V., Gentinne, B.
Zdroj: Electronics Letters (Institution of Engineering & Technology); 09/12/1996, Vol. 32 Issue 19, p1834-1835, 2p
Databáze: Complementary Index