Alternative channel materials for MOS devices.

Autor: Heyns, M., Adelmann, C., Brammertz, G., Brunco, D., Caymax, M., De Jaeger, B., Delabie, A., Eneman, G., Houssa, M., Lin, D., Martens, K., Merckling, C., Meuris, M., Mittard, J., Penaud, J., Pourtois, G., Scarrozza, M., Simoen, E., Sioncke, S., Wei-E Wang
Zdroj: Silicon Nanoelectronics Workshop, 2008. SNW 2008. IEEE; 2008, p1-2, 2p
Databáze: Complementary Index