Assessing chip-level impact of double patterning lithography.
Autor: | Kwangok Jeong, Kahng, A.B., Topaloglu, R.O. |
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Zdroj: | 2010 11th International Symposium on Quality Electronic Design (ISQED); 2010, p122-130, 9p |
Databáze: | Complementary Index |
Externí odkaz: |