Diagnostics of plasma process induced failure on analog device's mismatch characteristics.
Autor: | Shih, J.R., Huang, A., Chinn, Y.H., Chin, C.C., Yeng Peng, Yue, J.T. |
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Zdroj: | 7th International Symposium on Plasma & Process-Induced Damage; 2002, p64-67, 4p |
Databáze: | Complementary Index |
Externí odkaz: |