Diagnostics of plasma process induced failure on analog device's mismatch characteristics.

Autor: Shih, J.R., Huang, A., Chinn, Y.H., Chin, C.C., Yeng Peng, Yue, J.T.
Zdroj: 7th International Symposium on Plasma & Process-Induced Damage; 2002, p64-67, 4p
Databáze: Complementary Index