Effective interconnect networks design in CMOS 45 nm circuits to joint reductions of XT and delay for transmission of very high speed signals.

Autor: de Rivaz, S., Farcy, A., Deschacht, D., Lacrevaz, T., Flechet, B.
Zdroj: 2010 IEEE Electrical Design of Advanced Packaging & Systems Symposium (EDAPS); 2010, p1-4, 4p
Databáze: Complementary Index