Systematic study of the relationship between 1/ƒ noise, interface state defects and mobility ddgradtion of high-K /metal CMOSFETs on (110) and (100) substrate.
Autor: | Sato, M., Aoyama, T., Nara, Y., Ohji, Y. |
---|---|
Zdroj: | 2009 IEEE International Reliability Physics Symposium; 2009, p45-50, 6p |
Databáze: | Complementary Index |
Externí odkaz: |