Run-to-run process control for chemical mechanical polishing in semiconductor manufacturing.
| Autor: | Da, L., Kumar, V.G., Tay, A., Al Mamun, A., Weng Khuen Ho, See, A., Chan, L. |
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| Zdroj: | Proceedings of the IEEE International Symposium on Intelligent Control; 2002, p740-745, 6p |
| Databáze: | Complementary Index |
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