Ultra-Low Leakage Silicon-on-Insulator Technology for 65 nm Node and Beyond.
| Autor: | Jin Cai, Majumdar, A., Dobuzinsky, D., Ning, T.H., Koester, S.J., Haensch, W.E. |
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| Zdroj: | 2007 IEEE International Electron Devices Meeting; 2007, p907-910, 4p |
| Databáze: | Complementary Index |
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