Implant charging dependence on photo resist bake and electron flood gun.
Autor: | Romig, T., King Chao, Rendon, M.J., Azrack, M. |
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Zdroj: | 2000 International Conference on Ion Implantation Technology Proceedings Ion Implantation Technology - 2000 (Cat. No.00EX432); 2000, p558-560, 3p |
Databáze: | Complementary Index |
Externí odkaz: |