Implant charging dependence on photo resist bake and electron flood gun.

Autor: Romig, T., King Chao, Rendon, M.J., Azrack, M.
Zdroj: 2000 International Conference on Ion Implantation Technology Proceedings Ion Implantation Technology - 2000 (Cat. No.00EX432); 2000, p558-560, 3p
Databáze: Complementary Index