| Autor: |
Cook, J. G., Das, S. R., Quance, T. A. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 8/15/1990, Vol. 68 Issue 4, p1635, 6p, 2 Diagrams, 1 Chart, 5 Graphs |
| Abstrakt: |
Examines the plasma potential and electron density of a radio frequency (rf)-magnetron discharge used for ion-assisted growth of PbTe epilayers. Application of Langmuir probe diagnostics in the study; Effect of rf potentials at the probe with regard to the measured plasma parameters of the lead compound; Assessment of discharge parameters of the rf potentials. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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