Real-time, in situ infrared study of etching of Si(100) and (111) surfaces in dilute hydrofluoric acid solution.
| Autor: | Niwano, Michio, Miura, Taka-aki, Kimura, Yasuo, Tajima, Ryo, Miyamoto, Nobuo |
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| Zdroj: | Journal of Applied Physics; 4/1/1996, Vol. 79 Issue 7, p3708, 6p, 2 Diagrams, 7 Graphs |
| Abstrakt: | Presents a study which investigated the chemical nature of silicon(100) and (111) surfaces during immersion in dilute hydrofluoric acid solution. Review of related literature; Methodology; Results. |
| Databáze: | Complementary Index |
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