Optical determination of free-carrier concentration in epitaxial layers of n-type silicon grown on N+ or N- substrates.

Autor: Geddo, M., Maghini, D., Stella, A., Cottini, M.
Předmět:
Zdroj: Journal of Applied Physics; 12/15/1985, Vol. 58 Issue 12, p4733, 3p, 3 Graphs
Abstrakt: Reports on the optical determination of free-carrier concentration in epitaxial layers on n-type silicon grown on N[sup+] or N[sup-] substrates. Significance of the growth of epitaxial layers; Main properties of the epitaxial layers; Difference between Brewster angles epitaxial layer and pure single-crystal silicon.
Databáze: Complementary Index