| Autor: |
Ruane, M. F., Calkins, J. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 4/15/1988, Vol. 63 Issue 8, p3630, 3p, 3 Black and White Photographs, 2 Charts, 1 Graph |
| Abstrakt: |
Presents a study that characterized TbFeCo samples, deposited on quartz substrates in four different sputtering runs, by RBS, VSM, Kerr loop tracing, and polarization microscope photographs. Capability of sputter-deposited amorphous TbFeCo films; Factor related to the shape of observed domains and their internal magnetization patterns; List of controllable process factors. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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