| Autor: |
Kamei, Masayuki, Yoshida, Isao, Takahashi, Hiromi, Itti, Rittaporn, Morishita, Tadataka |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 10/15/1992, Vol. 72 Issue 8, p3622, 4p, 1 Black and White Photograph, 1 Diagram, 1 Chart, 5 Graphs |
| Abstrakt: |
Presents a study which utilized the reactive evaporation method of heteroepitaxial Y[sub1]Ba[sub2]Cu[sub3]O[sub7-subx] films grown on MgO(100) substrates. Impact of the reflection high energy electron diffraction patterns on the thin films; Accumulation of hydrogen induced defects during the heteroepitaxial growth of the films. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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