| Autor: |
Kikkawa, Takamaro, Endo, Nobuhiro |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 1/15/1992, Vol. 71 Issue 2, p958, 8p, 6 Graphs |
| Abstrakt: |
Presents an overview of a study on the influence of underlying metals on hydrogen evolution from plasma-enhanced chemical vapor deposited silicon nitride (P-SiN) films. Factors that influence the hydrogen evolution rates for P-SiN films; Film stresses as a function of temperature; Dependence of underlying aluminum alloys on hydrogen evolution |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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