| Autor: |
Olowolafe, J. O., Li, Jian, Mayer, J. W. |
| Předmět: |
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| Zdroj: |
Journal of Applied Physics; 12/15/1990, Vol. 68 Issue 12, p6207, 6p |
| Abstrakt: |
Studies that interactions of Cu with CoSi[sub2], CrSi[sub2] and TiSi[sub2] with and without interposed TiN[sub x] layers using Rutherford backscattering spectrometry, Auger electron spectrometry, X-ray diffraction and in situ sheet resistivity measurements. Discussion on the methodology of the study; Details of the results of the study. |
| Databáze: |
Complementary Index |
| Externí odkaz: |
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