Completion of the β tool and the recent progress of low energy e-beam proximity projection lithography.
| Autor: | Endo, Akihiro, Higuchi, Akira, Nozue, Hiroshi, Shimazu, Nobuo, Fukui, Toyoji, Yasumitsu, Naoki, Miyatake, Tsutomu, Anazawa, Norimichi |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2003, Vol. 21 Issue 1, p311-315, 5p |
| Databáze: | Complementary Index |
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