Use of orthogonal polynomial functions for endpoint detection during plasma etching of patterned wafers.
| Autor: | Rietman, Edward A., Layadi, Nace, Downey, Steve W. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2000, Vol. 18 Issue 5, p2500-2504, 5p |
| Databáze: | Complementary Index |
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