Role of sidewall scattering in feature profile evolution during Cl2 and HBr plasma etching of silicon.

Autor:	Vyvoda, M. A., Li, M., Graves, D. B., Lee, H., Malyshev, M. V., Klemens, F. P., Lee, J. T. C., Donnelly, V. M.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2000, Vol. 18 Issue 2, p820-833, 14p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu