High-aspect-ratio nanophotonic components fabricated by Cl2 reactive ion beam etching.
| Autor: | Zubrzycki, W. J., Vawter, G. A., Wendt, J. R. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 6, p2740-2744, 5p |
| Databáze: | Complementary Index |
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