Characterization of Al, Cu, and TiN surface cleaning following a low-K dielectric etch.

Autor:	Matsuo, P. J., Standaert, T. E. F. M., Allen, S. D., Oehrlein, G. S., Dalton, T. J.
Zdroj:	Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 4, p1435-1447, 13p
Databáze:	Complementary Index
Externí odkaz:	Zobrazit plný text záznamu