Optimized cleaning and conditioning of a five station tetrakis diethylamido titanium chemical vapor deposition TiN chamber.
| Autor: | Whelan, C. S., Bulger, J. M., Dumont, A., Clark, J., Kuhn, M. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1999, Vol. 17 Issue 1, p194-200, 7p |
| Databáze: | Complementary Index |
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