Low energy electron beam top surface image processing using chemically amplified AXT resist.
| Autor: | Whelan, C. S., Tanenbaum, D. M., La Tulipe, D. C., Isaacson, M., Craighead, H. G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1997, Vol. 15 Issue 6, p2555-2560, 6p |
| Databáze: | Complementary Index |
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