High-resolution silicon patterning with self-assembled monolayer resists.
Autor: | Lercel, M. J., Whelan, C. S., Craighead, H. G., Seshadri, K., Allara, D. L. |
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Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p4085-4090, 6p |
Databáze: | Complementary Index |
Externí odkaz: |