High-resolution silicon patterning with self-assembled monolayer resists.

Autor: Lercel, M. J., Whelan, C. S., Craighead, H. G., Seshadri, K., Allara, D. L.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p4085-4090, 6p
Databáze: Complementary Index