Fabrication of metal-oxide-semiconductor devices with extreme ultraviolet lithography.

Autor: Nguyen, K. B., Cardinale, G. F., Tichenor, D. A., Kubiak, G. D., Berger, K., Ray-Chaudhuri, A. K., Perras, Y., Haney, S. J., Nissen, R., Krenz, K., Stulen, R. H., Fujioka, H., Hu, C., Bokor, J., Tennant, D. M., Fetter, L. A.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p4188-4192, 5p
Databáze: Complementary Index