Multiple-pass writing optimization for proximity x-ray mask-making using electron-beam lithography.
| Autor: | Puisto, Denise M., Lawliss, Mark S., Rocque, Janet M., Kimmel, Kurt R., Hartley, John G. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p4341-4344, 4p |
| Databáze: | Complementary Index |
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