Micromachining applications of a high resolution ultrathick photoresist.
| Autor: | Lee, K. Y., LaBianca, N., Rishton, S. A., Zolgharnain, S., Gelorme, J. D., Shaw, J., Chang, T. H.-P. |
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| Zdroj: | Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p3012-3016, 5p |
| Databáze: | Complementary Index |
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