Micromachining applications of a high resolution ultrathick photoresist.

Autor: Lee, K. Y., LaBianca, N., Rishton, S. A., Zolgharnain, S., Gelorme, J. D., Shaw, J., Chang, T. H.-P.
Zdroj: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p3012-3016, 5p
Databáze: Complementary Index